ALEXANDRIA, Va., July 15 -- United States Patent no. 12,663,711, issued on June 23, was assigned to Taiwan Semiconductor Manufacturing Co. Ltd. (Hsinchu, Taiwan). "Method and system to for rapid insp... और पढ़ें
ALEXANDRIA, Va., July 15 -- United States Patent no. 12,663,712, issued on June 23, was assigned to CANON K.K. (Tokyo). "Forming method, forming apparatus, and article manufacturing method" was inven... और पढ़ें
ALEXANDRIA, Va., July 15 -- United States Patent no. 12,663,713, issued on June 23, was assigned to Koninklijke Philips N.V. (Eindhoven, Netherlands). "Imprinting apparatus" was invented by Didier Ma... और पढ़ें
ALEXANDRIA, Va., July 15 -- United States Patent no. 12,663,714, issued on June 23, was assigned to SHIN-ETSU CHEMICAL Co. LTD. (Tokyo). "Resist composition and pattern forming process" was invented ... और पढ़ें
ALEXANDRIA, Va., July 15 -- United States Patent no. 12,663,715, issued on June 23, was assigned to Chang Chun Plastics Co. Ltd. (Taipei City, Taiwan). "Photosensitive resin film and application ther... और पढ़ें
ALEXANDRIA, Va., July 15 -- United States Patent no. 12,663,716, issued on June 23, was assigned to NISSAN CHEMICAL Corp. (Tokyo). "Chemical-resistant protective film" was invented by Tokio Nishita (... और पढ़ें
ALEXANDRIA, Va., July 15 -- United States Patent no. 12,663,718, issued on June 23, was assigned to NISSAN CHEMICAL Corp. (Tokyo). "Resist underlayer film-forming composition" was invented by Hirokaz... और पढ़ें
ALEXANDRIA, Va., July 15 -- United States Patent no. 12,663,719, issued on June 23, was assigned to NISSAN CHEMICAL Corp. (Tokyo). "Resist underlayer film-forming composition" was invented by Hiroto ... और पढ़ें
ALEXANDRIA, Va., July 15 -- United States Patent no. 12,663,720, issued on June 23, was assigned to Semes Co. Ltd. (Chungcheongnam-do, South Korea) and Seoul National University R&DB Foundation (Seoul... और पढ़ें
ALEXANDRIA, Va., July 15 -- United States Patent no. 12,663,721, issued on June 23, was assigned to Semes Co. Ltd. (Chungcheongnam-do, South Korea). "Apparatus and method for treating substrate" was ... और पढ़ें